The semiconductor industry, constrained by the protracted delay in the introduction of next-generation lithography, has had to extend optical lithography below the 100-nanometer node by adopting ...

May 22, 2014. KLA-Tencor has announced the Teron SL650, a new reticle quality-control solution for IC fabs that supports 20-nm design nodes and beyond. With 193-nm illumination and multiple STARlight ...

There is growing concern over the impact the photomask has on the semiconductor industry's ability to develop new designs. As the industry shifts emphasis from computer-driven products to ...

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